@article{UBHD-68175131,
  author={Kleditzsch, Stefan and Riedel, Uwe},
  title={Sensitivity studies of silicon etching in chlorine/argon plasmas},
  year={2000},
  pages={2130-2136},
  language={eng},
  issn={1520-8559},
  volume={18},
  number={5},
  note={Gesehen am 02.10.2017},
  journal={Journal of vacuum science & technology},
  doi={10.1116/1.1285997},
}
@article{UBHD-68175098,
  author={Kleditzsch, Stefan and Riedel, Uwe},
  title={Sensitivity studies for volume averaged models of plasma etch reactors},
  year={2001},
  pages={536-539},
  language={eng},
  issn={1879-3347},
  volume={142},
  number={Supplement C},
  note={Gesehen am 02.10.2017},
  journal={Surface and coatings technology},
  doi={10.1016/S0257-8972(01)01068-4},
}
@article{UBHD-68175371,
  author={Nold, Michael and Kleditzsch, Stefan and Riedel, Uwe},
  title={Modelling inductively coupled plasmas},
  subtitle={a sensitivity study on plasma chemistry and surface chemistry},
  year={2001},
  pages={531-535},
  language={eng},
  issn={1879-3347},
  volume={142},
  note={Gesehen am 04.10.2017},
  journal={Surface and coatings technology},
  doi={10.1016/S0257-8972(01)01054-4},
}