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Nold, MichaelUniversität HeidelbergHeidelbergdeutsch

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  • Nold, Michael: Modelling inductively coupled plasmas : a sensitivity study on plasma chemistry and surface chemistry / M. Nold, S. Kleditzsch, U. Riedel, Interdisziplinäres Zentrum für Wissenschaftliches Rechnen, Univer… . - 5 S.
    In: Surface and coatings technology, ISSN 1879-3347. 142(2001), S. 531-535
    DOI: 10.1016/S0257-8972(01)01054-4

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