Processing follows function

• Verfasst von: Alt, Milan [VerfasserIn]
• Verfasst von: Hillebrandt, Sabina [VerfasserIn]
• Verfasst von: Glaser, Tobias [VerfasserIn]
• Verfasst von: Pucci, Annemarie [VerfasserIn]
• Titel: Processing follows function
• Titelzusatz: pushing the formation of self-assembled monolayers to high-throughput compatible time scales
• Verf.angabe: Milan Alt, Janusz Schinke, Sabina Hillebrandt, Marc Hänsel, Gerardo Hernandez-Sosa, Norman Mechau, Tobias Glaser, Eric Mankel, Manuel Hamburger, Kaja Deing, Wolfram Jaegermann, Annemarie Pucci, Wolfgang Kowalsky, Uli Lemmer, Robert Lovrincic
• E-Jahr: 2014
• Jahr: October 17, 2014
• Umfang: 8 S.
• Fussnoten: Gesehen am 07.07.2020
• Titel Quelle: Enthalten in: American Chemical SocietyACS applied materials & interfaces
• Ort Quelle: Washington, DC : Soc., 2009
• Jahr Quelle: 2014
• Band/Heft Quelle: 6(2014), 22, Seite 20234-20241
• ISSN Quelle: 1944-8252
• DOI: doi:10.1021/am5057689
• Datenträger: Online-Ressource
• Sprache: eng
• K10plus-PPN: 1703840038

Abstract

Self-assembled monolayers (SAMs) of organic molecules can be used to tune interface energetics and thereby improve charge carrier injection at metal−semiconductor contacts. We investigate the compatibility of SAM formation with high-throughput processing techniques. Therefore, we examine the quality of SAMs, in terms of work function shift and chemical composition as measured with photoelectron and infrared spectroscopy and in dependency on molecular exposure during SAM formation. The functionality of the SAMs is determined by the performance increase of organic field-effect transistors upon SAM treatment of the source/drain contacts. This combined analytical and device-based approach enables us to minimize the necessary formation times via an optimization of the deposition conditions. Our findings demonstrate that SAMs composed of partially fluorinated alkanethiols can be prepared in ambient atmosphere from ethanol solution using immersion times as short as 5 s and still exhibit almost full charge injection functionality if process parameters are chosen carefully. This renders solution-processed SAMs compatible with high-throughput solution-based deposition techniques.