| Online-Ressource |
Verfasst von: | Strunk, Karl-Philipp [VerfasserIn]  |
| Bojanowski, Maximilian [VerfasserIn]  |
| Huck, Christian [VerfasserIn]  |
| Bender, Markus [VerfasserIn]  |
| Veith, Lisa [VerfasserIn]  |
| Tzschoppe, Michael [VerfasserIn]  |
| Freudenberg, Jan [VerfasserIn]  |
| Wacker, Irene [VerfasserIn]  |
| Schröder, Rasmus R. [VerfasserIn]  |
| Pucci, Annemarie [VerfasserIn]  |
| Melzer, Christian [VerfasserIn]  |
| Bunz, Uwe H. F. [VerfasserIn]  |
Titel: | Electron-beam irradiation of cinnamate films affords nanoscale patterned substrates for use in devices and as scaffolds in tissue engineering |
Verf.angabe: | Karl-Philipp Strunk, N. Maximilian Bojanowski, Christian Huck, Markus Bender, Lisa Veith, Michael Tzschoppe, Jan Freudenberg, Irene Wacker, Rasmus R. Schröder, Annemarie Pucci, Christian Melzer, and Uwe H.F. Bunz |
E-Jahr: | 2020 |
Jahr: | June 5, 2020 |
Umfang: | 6 S. |
Fussnoten: | Gesehen am 08.10.2020 |
Titel Quelle: | Enthalten in: ACS applied nano materials |
Ort Quelle: | Washington, DC : ACS Publications, 2018 |
Jahr Quelle: | 2020 |
Band/Heft Quelle: | 3(2020), 8, Seite 7365-7370 |
ISSN Quelle: | 2574-0970 |
Abstract: | The fabrication of electronic, photonic, and metamaterial-based devices, or tissue engineering requires the controlled deposition and patterning of materials. Electron-beam lithography (EBL) offers unprecedented miniaturization of those devices because of its high resolution. We present a concept to induce a classic photochemical reaction in condensed matter via EBL. We investigate the response of a tetrameric cinnamate monomer in thin films toward photon and electron radiation. In the solid state, photoexcitation and electron bombardment similarly induce [2 + 2] cycloadditions, forming insoluble truxilic acid esters, as shown via IR spectroscopy measurements. Subsequently, we employed the investigated material as an electron-beam resist, showing resistance against wet-chemical etchants. Structures with resolution down to 60 nm were obtained, not achievable with conventional photolithography, proving that [2 + 2] cycloaddition of cinnamic acid containing compounds is suitable for applications in the field of EBL. |
DOI: | doi:10.1021/acsanm.0c00458 |
URL: | Bitte beachten Sie: Dies ist ein Bibliographieeintrag. Ein Volltextzugriff für Mitglieder der Universität besteht hier nur, falls für die entsprechende Zeitschrift/den entsprechenden Sammelband ein Abonnement besteht oder es sich um einen OpenAccess-Titel handelt.
Volltext: https://doi.org/10.1021/acsanm.0c00458 |
| DOI: https://doi.org/10.1021/acsanm.0c00458 |
Datenträger: | Online-Ressource |
Sprache: | eng |
K10plus-PPN: | 1735216666 |
Verknüpfungen: | → Zeitschrift |
Electron-beam irradiation of cinnamate films affords nanoscale patterned substrates for use in devices and as scaffolds in tissue engineering / Strunk, Karl-Philipp [VerfasserIn]; June 5, 2020 (Online-Ressource)