Efficient extreme ultraviolet mirror design

• Verfasst von: Lee, Yen-Min [VerfasserIn]
• Titel: Efficient extreme ultraviolet mirror design
• Titelzusatz: an FDTD approach
• Verf.angabe: Yen-Min Lee (ASML Holding)
• Ausgabe: Version: 20210901
• Verlagsort: Bristol, UK
• Verlag: IOP Publishing
• E-Jahr: 2021
• Jahr: [2021]
• Umfang: 1 Online-Ressource (getrennte Seitenzählung)
• Illustrationen: Illustrationen
• Gesamttitel/Reihe: IOP series in advances in optics, photonics and optoelectronics
• Gesamttitel/Reihe: IOP ebooks. [2021 collection]
• Gesamttitel/Reihe: IOP ebooks
• ISBN: 978-0-7503-2652-0
• ISBN: 978-0-7503-2651-3
• DOI: doi:10.1088/978-0-7503-2652-0
• Datenträger: Online-Ressource
• Sprache: eng
• Bibliogr. Hinweis: Erscheint auch als : Druck-Ausgabe
• Sach-SW: Optical physics
• Sach-SW: Optics and photonics
• K10plus-PPN: 1772748153
• K10plus-PPN:
  Universitätsbibliothek
• Lokale URL UB: Zum Volltext

Abstract

Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel's equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method.