Tailored antireflective biomimetic nanostructures for UV applications

• Verfasst von: Morhard, Christoph [VerfasserIn]
• Verfasst von: Pacholski, Claudia [VerfasserIn]
• Verfasst von: Lehr, Dennis [VerfasserIn]
• Verfasst von: Brunner, Robert [VerfasserIn]
• Verfasst von: Helgert, Michael [VerfasserIn]
• Verfasst von: Sundermann, Michael [VerfasserIn]
• Verfasst von: Spatz, Joachim P. [VerfasserIn]
• Titel: Tailored antireflective biomimetic nanostructures for UV applications
• Verf.angabe: Christoph Morhard, Claudia Pacholski, Dennis Lehr, Robert Brunner, Michael Helgert, Michael Sundermann and Joachim P Spatz
• E-Jahr: 2010
• Jahr: 22 September 2010
• Umfang: 6 S.
• Fussnoten: Gesehen am 04.05.2023
• Titel Quelle: Enthalten in: Nanotechnology
• Ort Quelle: Bristol : IOP Publ., 1990
• Jahr Quelle: 2010
• Band/Heft Quelle: 21(2010), 42, Artikel-ID 425301, Seite 1-6
• ISSN Quelle: 1361-6528
• DOI: doi:10.1088/0957-4484/21/42/425301
• Datenträger: Online-Ressource
• Sprache: eng
• K10plus-PPN: 1844615243

Abstract

Antireflective surfaces composed of biomimetic sub-wavelength structures that employ the ‘moth eye principle’ for reflectance reduction are highly desirable in many optical applications such as solar cells, photodetectors and laser optics. We report an efficient approach for the fabrication of antireflective surfaces based on a two-step process consisting of gold nanoparticle mask generation by micellar block copolymer nanolithography and a multi-step reactive ion etching process. Depending on the RIE process parameters nanostructured surfaces with tailored antireflective properties can easily be fabricated that show optimum performance for specific applications.