Kleditzsch, Stefan Dipl.-Chem.Universität HeidelbergHeidelberg
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Publications in heiBIB 
- Nold, Michael: Modelling inductively coupled plasmas : a sensitivity study on plasma chemistry and surface chemistry / M. Nold, S. Kleditzsch, U. Riedel, Interdisziplinäres Zentrum für Wissenschaftliches Rechnen, Univer… . - 5 S.
In: Surface and coatings technology, ISSN 1879-3347. 142(2001), S. 531-535
DOI: 10.1016/S0257-8972(01)01054-4
- Kleditzsch, Stefan: Sensitivity studies for volume averaged models of plasma etch reactors / S. Kleditzsch, U. Riedel. - 4 S.
In: Surface and coatings technology, ISSN 1879-3347. 142(2001), Supplement C, S. 536-539
DOI: 10.1016/S0257-8972(01)01068-4
- Kleditzsch, Stefan: Sensitivity studies of silicon etching in chlorine/argon plasmas / S. Kleditzsch and U. Riedel. - 7 S.
In: Journal of vacuum science & technology, ISSN 1520-8559. 18(2000), 5, S. 2130-2136
DOI: 10.1116/1.1285997
